Gas-Phase Synthesis of Nanoparticles

INTRODUCTION TO GAS AGGREGATION SOURCES
History
Principles of Gas Aggregation
Types of Gas Aggregation Sources

RECENT MODIFICATIONS OF GAS AGGREGATION SOURCES
Multi-Element Approach
Hollow Cylindrical Magnetron
High Flux DC Magnetron Sputtering
High Flux Metal Vapor Cell
High-Power Microwave Plasma Source
Room Temperature Aggregation
HIPIMS
Pulsed Gas Aggregation
High Pressure and Reactive Gas Magnetron Sputtering

POST-GROWTH MANIPULATION OF NANOPARTICLES
Coating
Annealing
Deflection and Mass Filtering
Control Landing Energy
In Flight Analysis

PERSPECTIVES

Yves Huttel received his Ph.D. degree from the University of Paris-Sud, Orsay, France. After his degree he worked at the Synchrotron LURE, France, at the University of Paris-Sud, France, and at the ICMM-CSIC, Spain. He was also a postdoctoral researcher at the Synchrotron of Daresbury Laboratory, UK, before returning to the CSIC at the IMM. He joined the Surfaces, Coatings, and Molecular Astrophysics Department at the ICMM that belongs to the Consejo Superior de Investigaciones Científicas (CSIC), Spain, with a Ramón y Cajal Fellowship. Since 2007, he has been working at the ICMM as a Permanent Scientist and he leads the Low-Dimensional Advanced Materials Group. His research focuses on low-dimensional systems including surfaces, interfaces and nanoparticles, as well as XMCD, XPS and nanomagnetism.

Y. Huttel, Instituto de Ciencia de Materiales de Madrid, Spain